Color filter substrate, electrical optics device, method of manufacturing a color filter substrate,

专利摘要:
Provided are a color filter substrate and a reflective semi-transmissive electro-optical device capable of securing both the brightness of a reflective display and the saturation of a transmissive display. In addition, the difference in color between the reflective display and the transmissive display is reduced. A reflective layer 211 having an opening 211a is formed on the substrate 201, and a color filter 212 having colored layers 212r, 212g, and 212b is formed thereon. The colored layer 212c is provided on the opening 211a of the reflective layer 211.
公开号:KR20030007148A
申请号:KR1020020040607
申请日:2002-07-12
公开日:2003-01-23
发明作者:다키자와게이지；오타기리요시히로
申请人:세이코 엡슨 가부시키가이샤；
IPC主号:

专利说明:

COLOR FILTER SUBSTRATE, ELECTRICAL OPTICS DEVICE, METHOD OF MANUFACTURING A COLOR FILTER SUBSTRATE, METHOD OF MANUFACTURING AN ELECTRICAL OPTICS DEVICE AND ELECTRONIC APPARATUS}
[36] BACKGROUND OF THE INVENTION Field of the Invention The present invention relates to a color filter substrate and an electro-optical device, and a method for producing a color filter substrate and a method for producing an electro-optical device. In particular, the present invention relates to a color filter substrate suitable for use in a reflective semi-transmissive electro-optical device. It's about structure.
[37] DESCRIPTION OF RELATED ART Conventionally, the reflection semi-transmissive type | mold liquid crystal display panel which made it possible to visually recognize both the reflective display using external light and the transmissive display using illumination light, such as a backlight, is known. This reflective semi-transmissive liquid crystal display panel has a reflective layer for reflecting external light in the panel, and the reflective layer is configured to transmit illumination light such as backlight. As this kind of reflective layer, there is a pattern having a slit having a predetermined ratio for each pixel of the liquid crystal display panel.
[38] 18 is a schematic cross-sectional view schematically showing a schematic structure of a conventional reflective semi-transmissive liquid crystal display panel 100. The liquid crystal display panel 100 has a structure in which a substrate 101 and a substrate 102 are bonded by a sealing material 103, and a liquid crystal 104 is sealed between the substrate 101 and the substrate 102. Have
[39] On the inner surface of the substrate 101, a reflective layer 111 having an opening 111a is formed for each pixel, and a color filter having colored layers 112r, 112g, 112b and a protective film 112p on the reflective layer 111. 112 is formed. The transparent electrode 113 is formed on the surface of the protective film 112p of the color filter 112.
[40] On the other hand, the transparent electrode 121 is formed on the inner surface of the board | substrate 102, and is comprised so that it may cross | intersect the said transparent electrode 113 on the opposing board | substrate 101. FIG. Moreover, on the transparent electrode 113 on the board | substrate 101, and the transparent electrode 121 on the board | substrate 102, an orientation film, a hard transparent film, etc. are formed suitably as needed.
[41] In addition, a phase difference plate (1/4 wave plate) 105 and a polarizing plate 106 are sequentially disposed on the outer surface of the substrate 102, and a phase difference plate (1/4 wave plate) (on the outer surface of the substrate 101) ( 107 and the polarizing plate 108 are sequentially arranged.
[42] When the liquid crystal display panel 100 configured as described above is installed in an electronic device such as a cellular phone or a portable information terminal, the liquid crystal display panel 100 is mounted with the backlight 109 disposed behind the liquid crystal display panel 100. In the liquid crystal display panel 100, in a bright place such as daytime or indoors, external light passes through the liquid crystal 104 along the reflection path R and then is reflected by the reflective layer 111, and then passes through the liquid crystal 104 again. Since it is emitted, the reflective display is visually recognized. On the other hand, when the backlight 109 is turned on in a dark place such as at night or outdoors, light passing through the opening 111a of the illumination light of the backlight 109 is along the transmission path T (the liquid crystal display panel ( Since it is emitted through 100), the transmissive display is recognized.
[43] However, in the conventional reflective semi-transmissive liquid crystal display panel 100, while light passes through the color filter 112 twice in the reflection path R, light passes through the color filter 112 in the transmission path T. Since only once passes through, the saturation in the transmissive display deteriorates with respect to the saturation of the reflective display. That is, since the brightness of the display is generally insufficient in the reflective display, it is necessary to set the light transmittance of the color filter 112 high to ensure the brightness of the display. In this case, sufficient saturation can be obtained in the transmissive display. There will be no.
[44] In addition, as described above, in the reflective display and the transmissive display, since the number of times that light passes through the color filter is different, the color of the reflective display and the color of the transmissive display are greatly different. have.
[45] Therefore, the present invention solves the above problems, and the problem is that the brightness of the reflective display and the saturation of the transmissive display can be secured together when the display device is used for both the reflective display and the transmissive display. It is to provide a color filter substrate. Moreover, it is providing the reflective semi-transmissive electro-optical device which can ensure the brightness of a reflective display and the saturation of a transmissive display together. Moreover, it aims at realizing the display technique which can reduce the difference of the color between a reflective display and a transmissive display.
[1] 1 is a schematic cross-sectional view schematically showing the structure of a liquid crystal display panel of a first embodiment according to the present invention;
[2] 2 is a schematic cross-sectional view schematically showing the structure of a liquid crystal display panel of a second embodiment according to the present invention;
[3] 3 is a schematic sectional view schematically showing the structure of a liquid crystal display panel of a third embodiment according to the present invention;
[4] 4 is a schematic cross-sectional view schematically showing the structure of a liquid crystal display panel of a fourth embodiment according to the present invention;
[5] 5 is a schematic cross-sectional view schematically showing the structure of a liquid crystal display panel of a fifth embodiment according to the present invention;
[6] 6 is a schematic cross-sectional view schematically showing the structure of a liquid crystal display panel of a sixth embodiment according to the present invention;
[7] 7 is a schematic sectional view schematically showing the structure of a liquid crystal display panel of a seventh embodiment according to the present invention;
[8] 8 is a schematic cross-sectional view schematically showing the structure of a liquid crystal display panel of an eighth embodiment according to the present invention;
[9] 9 is a schematic plan view schematically showing the planar structure of a color filter substrate of a first embodiment;
[10] 10 is a schematic process diagram (a) to (d) which schematically shows a manufacturing method of a color filter substrate according to a ninth embodiment according to the present invention;
[11] 11 is a schematic process diagram (a) to (d) schematically showing a method for manufacturing a color filter substrate according to a tenth embodiment according to the present invention;
[12] 12 is a schematic process diagram (a) to (d) which schematically shows a manufacturing method of a color filter substrate according to an eleventh embodiment according to the present invention;
[13] 13 is a schematic process diagram (a) to (d) which schematically shows a method for manufacturing a color filter substrate according to a twelfth embodiment according to the present invention;
[14] 14 is a schematic process diagram (a) to (d) which schematically shows a manufacturing method of a color filter substrate according to a thirteenth embodiment according to the present invention;
[15] 15 is a schematic process diagram (a) to (d) which schematically shows a method for manufacturing a color filter substrate according to a fourteenth embodiment according to the present invention;
[16] 16 is an explanatory diagram for explaining an optical function of a liquid crystal display panel according to the present invention;
[17] 17 is a schematic partial sectional views (a) to (d) which schematically show another structural example applicable to the above-described embodiments;
[18] 18 is a schematic cross-sectional view schematically showing the structure of a reflective semi-transmissive liquid crystal display panel having a conventional structure;
[19] 19 is an enlarged partial cross-sectional view of a color filter substrate of Example 1 and a plan view of a color filter to show a more specific structure;
[20] 20 is an enlarged partial cross-sectional view of a color filter substrate of Example 2 and a plan view of a color filter to show a more specific structure;
[21] 21 is an enlarged partial cross-sectional view of a color filter substrate of Example 3 and a plan view of a color filter to show a more specific structure;
[22] Fig. 22 is a diagram showing the spectral transmittance in the deep portion of the color filters formed in Examples 1 to 3, xy chromaticity diagram and a ^* b ^* chromaticity diagram,
[23] Fig. 23 is a diagram showing the spectral transmittances at the light color portion of the color filters formed in Examples 1 to 3, xy chromaticity diagram and a ^* b ^* chromaticity diagram,
[24] 24 is a schematic perspective view showing the appearance of a cellular phone as an example of an electronic apparatus provided with the electro-optical device of each embodiment;
[25] 25 is a schematic perspective view showing an appearance of a watch (wrist watch) as an example of an electronic apparatus provided with the electro-optical device of each embodiment;
[26] Fig. 26 is a schematic perspective view showing the appearance of a computer (information terminal) as an example of an electronic apparatus provided with the electro-optical device of each embodiment.
[27] Explanation of symbols for the main parts of the drawings
[28] 200: liquid crystal display panel 201, 202: substrate
[29] 203: Sealing material 204: Liquid crystal
[30] 205 and 207 retardation plates 206 and 208 polarizing plates
[31] 209: backlight 211: reflective layer
[32] 211a: opening 212: color filter
[33] 212r, 212g, 212b: colored layer 212BM: overlap light shielding layer
[34] 212c: deep portion 213, 221: transparent electrode
[35] R: reflection path T: transmission path
[46] In order to solve the said subject, the color filter substrate of this invention is a colored layer arrange | positioned at a board | substrate and the said board | substrate, and also has a light color part and a deep part with a light density higher than the said light color part. And a reflective layer disposed on the substrate and having a transmissive portion that is substantially transparent to light, and wherein the deepening portion is disposed so as to overlap at least in the transmissive portion in plan view.
[47] According to this invention, since the colored layer which has a pale-colored part and a deep color part is provided, and the deep color part is arrange | positioned so that it may overlap planarly with at least the transmissive part of a reflective layer, the light passing through the transmissive part of a reflective layer will permeate a deep color part, Saturation of transmitted light can be improved than before.
[48] Here, the light concentration refers to the capacity per unit thickness of the colored layer to bias the wavelength distribution of light. When the light concentration is high (large surface), the saturation of the transmitted light is strong, and when the light concentration is low (small), the saturation of transmitted light is small. Weakens. When a colored layer contains coloring materials, such as a pigment and dye, this light density normally has positive correlation with the quantity of the coloring material.
[49] Specific parameters having a correlation with the concept of color concentration include, for example, the Y value of the XYZ color system or the L ^* value of the Lab color system corresponding to visual transmittance or brightness, that is, the visible light region. For example, an integrated value of the spectral transmittance in (380 nm to 780 nm light wavelength region) can be used. This Y value or L ^* value has a correlation (eg an inverse relationship) with color concentration. Thus, the deep color portion Y values or L ^* value, the hypochromic portion Y values or L ^* value is to be smaller than that.
[50] As a specific parameter which has a correlation with the concept of color density, it is also possible to use the area of the polygon comprised from the point corresponding to the color of the said colored layer on a chromaticity diagram. The area of this polygon has a positive correlation (e.g. a proportional relationship) with the color concentration. Thus, for example, the area of the polygon consisting of the xy chromaticity diagram of the CIE (1931) color system or the color portion of the deep color portion of the a ^* b ^* chromaticity diagram of the CIE (1976) color system corresponds to the color of the pale color portion of the chromaticity diagram. It becomes larger than the area of the polygon consisting of points. For example, in the case of having three colored layers, the polygon is a triangle.
[51] The transmissive portion of the reflective layer is substantially transparent to light, and may form a transmissive portion by providing an opening in a portion of the reflective layer, or may form a transmissive portion by forming a part of the reflective layer thinly.
[52] In this case, it is preferable that the said pale color part is arrange | positioned so that it may overlap planarly with the said reflective layer except the said transmission part, and the said deep color part is arrange | positioned at the said board | substrate in which the said pale color part is not arrange | positioned. In this structure, since the pale color portion and the deep color portion are formed in different planar regions, the thickness of the color filter can be reduced, and the surface thereof can be formed flat.
[53] The reflective layer preferably has a reflecting portion in portions other than the transmissive portion, the transmissive portion is an opening provided in the reflective layer, and the pale color portion is preferably disposed so as to overlap at least in the reflecting portion in plan view.
[54] Moreover, it is preferable that the said colored layer has a laminated structure of the said pale color part and the said deep color part. In this structure, since it can be comprised only by laminating | stacking a light color part and a deep color part, it becomes easy to manufacture. In this case, any part of the pale color portion and the deep color portion may be formed thereon.
[55] Here, it is preferable to have a light-transmitting layer which is substantially transparent to light, and is partially disposed between the reflective layer and the colored layer, and the deep color portion is disposed in a region where the light-transmissive layer is not disposed. . In this way, the surface level | step difference can be provided between the pale-colored part and the deep color part with or without a translucent layer. Moreover, when the surface level | step difference between a pale color part and a deep color part is comprised so that it may become less than the thickness of the light-transmitting layer partially arrange | positioned, it can be comprised so that a deep color part may become thicker than a pale color part. Therefore, the saturation of the transmitted light can be further increased.
[56] At this time, the light transmitting layer preferably has a scattering function of scattering light. In this case, in the case where the reflective display is visually recognized through the color filter substrate, the illumination light due to the specular reflection of the reflective layer, the illusion caused by sunlight or the background image can be reduced. Here, the scattering function of the light transmitting layer can be obtained by fine irregularities on the surface of the light transmitting layer or by fine particles dispersed in the light transmitting layer.
[57] Moreover, it is preferable to provide the underlayer partly arrange | positioned between the said reflection layer and the said board | substrate, and the said rich part is arrange | positioned in the area | region where the underlayer is not arrange | positioned.
[58] In this way, the surface level | step difference can be provided between the pale color part and the deep color part with or without a base layer. Moreover, when the surface level | step difference between a pale color part and a deep part is comprised so that it may become less than the thickness of the underlayer arrange | positioned partially, it can be comprised so that a deep part may become thicker than a pale part. Therefore, the saturation of the transmitted light can be further increased.
[59] At this time, the surface of the reflective layer preferably has fine unevenness to scatter light. In this way, in the case of visually reflecting the reflective display through the color filter substrate, illumination light due to the specular reflection of the reflective layer, sun illusion caused by sunlight or the background image can be reduced.
[60] In each said means, it is preferable that the said board | substrate has a recessed part, and the said deepening part is arrange | positioned in the said recessed part. Since the deep color portion is disposed in the concave portion, the surface level can be provided between the light color portion and the deep color portion of the colored layer. Moreover, when the surface level | step difference between a pale color part and a deep color part is comprised so that it may become less than the depth of a recessed part, it can be comprised so that a deep color part may become thicker than a pale color part. Therefore, the saturation of the transmitted light can be further increased.
[61] Next, another color filter substrate of the present invention is disposed on the substrate, and includes a colored layer having a deep color portion, wherein the deep color portion has a higher light density than the other portions. When the colored layer has a deep color portion, the saturation of the light passing through the deep color portion can be made higher than that of the light passing through the other portion. Therefore, the color filter substrate can be used in a liquid crystal device having a reflective layer having a transmissive portion (opening portion) that substantially transmits light, and the saturation of transmitted light can be increased more than before by arranging the deep color portion so as to match the transmissive portion. . Here, it is preferable that the color filter substrate has a deep color portion for each of the plurality of pixel regions.
[62] In addition, it is preferable to have a light transmitting layer that is substantially transparent to light, and partially disposed between the substrate and the colored layer, wherein the deep color portion is disposed in an area where the light transmitting layer is not disposed. . According to this color filter board | substrate, the surface level | step difference can be provided between the pale color part and the deep color part with or without a translucent layer. Moreover, when the surface level | step difference between a pale color part and a deep color part is comprised so that it may become less than the thickness of the light-transmitting layer partially arrange | positioned, it can be comprised so that a deep color part may become thicker than a pale color part. Therefore, the saturation of the transmitted light can be further increased.
[63] In addition, it is preferable that the substrate has a recess, and the deep color portion is disposed in the recess. Since the deep color portion is disposed in the concave portion, the surface level can be provided between the light color portion and the deep color portion of the colored layer. Moreover, if the surface level | step difference between a pale color part and a deep part is comprised so that it may be less than the depth of a recessed part, it can be comprised so that a deep part may become thicker than a pale part. Therefore, the saturation of the transmitted light can be further increased.
[64] Next, the electro-optical device of the present invention includes an electro-optical layer comprising an electro-optic material, a substrate supporting the electro-optical layer, a reflective layer disposed on the substrate, and having a transmissive portion that is substantially transparent to light; And a colored layer disposed on the substrate and having a deeper portion and a deeper portion having a higher light concentration than the light portion, wherein the deep portion is disposed so as to overlap at least with the transmissive portion in plan view.
[65] According to the present invention, since the deep color portion is disposed so as to overlap the transmissive portion of the reflective layer in a planar manner, the light passing through the transmissive portion of the reflective layer is transmitted through the deep colored portion, so that the saturation of the transmitted light can be improved than before.
[66] Here, it is preferable that the pale color portion is disposed so as to overlap with the reflective layer except for the transmissive portion in a plane, and the deep color portion is disposed in an area where the pale color portion is not disposed. In this structure, since the pale color portion and the deep color portion are formed in different planar regions, the thickness of the color filter can be reduced, and the surface thereof can be formed flat.
[67] Moreover, it is preferable that the said colored layer has a laminated structure of the said pale color part and the said deep color part. In this structure, since it can be comprised only by laminating | stacking a light color part and a deep color part, it becomes easy to manufacture. In this case, any part of the pale color portion and the deep color portion may be formed thereon.
[68] In addition, it is preferable to have a transmissive layer through which light can be substantially transmitted, which is disposed between the reflective layer and the colored layer, and the rich portion is preferably disposed in a region where the transmissive layer is not disposed. In this way, the surface level | step difference can be provided between the pale color part and the deep color part with or without a light transmission layer. Moreover, when the surface level | step difference between a pale color part and a deep color part is comprised so that it may become less than the thickness of the light-transmitting layer partially arrange | positioned, it can be comprised so that a deep color part may become thicker than a pale color part. Therefore, the saturation of the transmitted light can be further increased.
[69] At this time, the light transmitting layer preferably has a scattering function of scattering light. In this way, in the case of visually reflecting the reflective display through the color filter substrate, illumination light due to the specular reflection of the reflective layer, sun illusion caused by sunlight or the background image can be reduced. Here, the scattering function of the light transmitting layer can be obtained by fine irregularities on the surface of the light transmitting layer or by fine particles dispersed in the light transmitting layer.
[70] In addition, it is preferable to include an underlayer partially disposed between the reflective layer and the substrate, and the deep color portion is disposed on the substrate on which the underlayer is not disposed. In this way, the surface level | step difference can be provided between the pale color part and the deep color part with or without a base layer. Moreover, when the surface level | step difference between a pale color part and a deep part is comprised so that it may become less than the thickness of the underlayer arrange | positioned partially, it can be comprised so that a deep part may become thicker than a pale part. Therefore, the saturation of the transmitted light can be further increased.
[71] Here, it is preferable that the surface of the reflective layer has fine irregularities that scatter light. In this case, when the reflective display is visually recognized, it is possible to reduce the illumination light due to the specular reflection of the reflective layer, the confusion caused by sunlight or the background image.
[72] Moreover, it is preferable that the recessed part is provided in the said board | substrate, and the said deep color part is arrange | positioned in this recessed part. Since the deep color portion is disposed in the concave portion, the surface level can be provided between the light color portion and the deep color portion of the colored layer. Moreover, when the surface level | step difference between a pale color part and a deep color part is comprised so that it may become less than the depth of a recessed part, it can be comprised so that a deep color part may become thicker than a pale color part. Therefore, the saturation of the transmitted light can be further increased.
[73] Said electro-optical device may be provided with the opposing board | substrate arrange | positioned facing the said board | substrate via the said electro-optical layer.
[74] In addition, another electro-optical device of the present invention includes an electro-optical layer comprising an electro-optic material, a first substrate supporting the electro-optic layer, and a transmissive portion disposed on the first substrate and substantially transmitting light. And a colored layer having a reflecting layer having a light emitting portion, a second substrate disposed to face the first substrate, and a color layer disposed on the second substrate and having a lighter portion and a deeper portion having a higher light density than the lighter portion. The part is disposed so as to overlap at least in the transmissive part in plan view.
[75] According to the present invention, a reflective layer having a transmissive portion is disposed on the first substrate, a colored layer having a pale color portion and a deep color portion is disposed on the second substrate, and the deep colored portion is disposed so as to overlap at least with the transmissive portion in a planar manner. Since the light passing through the transmission portion passes through the deep color portion, the saturation of the transmitted light can be improved.
[76] Here, it is provided with a light-transmitting layer through which light can be substantially transmitted, which is partially disposed between the second substrate and the colored layer, and wherein the color portion is disposed in an area where the light-transmitting layer is not disposed. desirable. In this way, the surface level | step difference can be provided between the pale color part and the deep color part with or without a light transmission layer. Moreover, when the surface level | step difference between a pale color part and a deep color part is comprised so that it may become less than the thickness of the light-transmitting layer partially arrange | positioned, it can be comprised so that a deep color part may become thicker than a pale color part. Therefore, the saturation of the transmitted light can be further increased.
[77] Moreover, it is preferable that the said 2nd board | substrate has a recessed part, and the said deep color part is arrange | positioned in the said recessed part. Since the deep color portion is disposed in the concave portion, the surface level can be provided between the light color portion and the deep color portion of the colored layer. Moreover, when the surface level | step difference between a pale color part and a deep color part is comprised so that it may become less than the depth of a recessed part, it can be comprised so that a deep color part may become thicker than a pale color part. Therefore, the saturation of the transmitted light can be further increased.
[78] Moreover, the 1st board | substrate and the 2nd board | substrate which are arrange | positioned at the both sides of the electro-optical layer containing an electro-optic substance are provided, and a colored layer is arrange | positioned on either board | substrate of a 1st board | substrate and a 2nd board | substrate, and the other board | substrate is provided. It is also possible to arrange | position a limited coloring layer in the area | region overlapping planarly on the permeation | transmission part of a reflection layer. In this case, since the light passing through the transmissive portion of the reflective layer is transmitted through the limited colored layer, the saturation of the transmitted light can be improved. Here, it is preferable that the light concentration of a limited colored layer is higher than a colored layer.
[79] Next, the manufacturing method of the color filter board | substrate of this invention is the process of forming the pale color part of a colored layer in a 1st area | region, and the colored layer whose light concentration is higher than the said pale color part in the 2nd area | region adjacent to the said 1st area | region. It is characterized by having a process of forming a deep color portion.
[80] Moreover, the manufacturing method of the electro-optical device of this invention is a process of forming the pale color part of a colored layer in a 1st area | region, and in the 2nd area | region adjacent to the said 1st area, It comprises as a process the manufacturing method of the color filter substrate which has the process of forming a deep color part.
[81] Next, the electronic device of the present invention comprises an electro-optical layer comprising an electro-optic material, a substrate supporting the electro-optical layer, a reflective layer disposed on the substrate, and having a transmissive portion that can substantially transmit light; And a colored layer disposed on the substrate, the colored layer having a lighter portion and a deeper portion having a higher light concentration than the lighter portion, wherein the deeper portion is disposed so as to overlap at least with the transmissive portion in a planar manner. do.
[82] In addition, another electronic device of the present invention includes an electro-optical layer comprising an electro-optic material, a first substrate supporting the electro-optical layer, and a transmissive portion disposed on the first substrate and substantially transmitting light. And a reflective layer having a second layer disposed to face the first substrate, and a colored layer disposed on the second substrate and having a light color portion and a deep color portion having a higher light density than the light color portion. An electro-optical device is disposed so as to overlap at least with the transmissive portion in plan view.
[83] Embodiment of the invention
[84] EMBODIMENT OF THE INVENTION Next, with reference to an accompanying drawing, embodiment of the color filter board | substrate and electro-optical device which concerns on this invention, and their manufacturing method is described in detail.
[85] [First embodiment]
[86] 1 is a schematic cross-sectional view schematically showing a substrate 201 which is a first embodiment of a color filter substrate according to the present invention and a liquid crystal display panel 200 which is a first embodiment of an electro-optical device using the color filter substrate. to be.
[87] In this liquid crystal display panel 200, the board | substrate 201 and board | substrate 202 which consist of glass, a plastics, etc. are joined through the sealing material 203, and the liquid crystal 204 is enclosed inside. The substrate 202, the transparent electrodes 221, the retardation plates 205 and 207, and the polarizing plates 206 and 208 formed on the substrate 202 are completely the same as the conventional example shown in FIG.
[88] In the present embodiment, a reflection layer 211 is provided on the inner surface of the substrate 201 with an opening 211a serving as a transmission portion that can transmit light substantially. The reflective layer 211 can be formed of a thin film of aluminum, aluminum alloy, silver alloy or the like. The opening 211a is formed to have a predetermined opening ratio (for example, 10 to 30%) on the basis of the entire area of the pixel G for each pixel G arranged in a matrix shape along the inner surface of the substrate 210. It is.
[89] 9 is a plan view of the substrate 201 viewed from above. This opening part 211a is comprised by planar view rectangle as shown, for example by the dotted line in FIG. 9, and is formed in pixel G at the center of the pixel G by the center. However, the position and the shape of the opening 211a are arbitrary, and the number of the openings 211a is arbitrary, and unlike the present embodiment, a plurality of openings may be provided for each pixel.
[90] On the reflective layer 211, for example, in the case of the primary color filter, the colored layers 212r, 212g, and 212b each having three colors of R (red), G (green), and B (blue) are, for example, known stripes. Each pixel G is arranged in an appropriate arrangement form (the color filter of the stripe arrangement is shown in Fig. 9), such as an arrangement, a delta (triangle) arrangement, and an oblique mosaic (diagonal) arrangement. Here, the overlapping light shielding portion 212BM showing the light shielding property is formed between the colored layers 212r, 212g, and 212b overlapping each other. Here, each of the colored layers 212r, 212g, and 212b has a substantially flat surface except for the portion of the overlapping light shielding portion 212BM.
[91] In each of the colored layers 212r, 212g, and 212b, a deep color portion 212c is provided on the opening 211a of the reflective layer 211, and portions other than the deep color portion 212c are more than the deep color portion 212c. It is a light-colored pale color part with a small light density. The deep color portion 212c having a high light density is configured such that, for example, the concentration of colorants such as pigments and dyes dispersed in the translucent resin is higher than the concentration in the pale color portion.
[92] On the colored layers 212r, 212g, 212b and the overlapping light shielding portion 212BM, a protective film 212p made of transparent resin or the like is formed. This protective film 212p is for protecting the colored layer from corrosion and contamination by chemicals or the like in the process and for flattening the surface of the color filter 212.
[93] On the color filter 212, a transparent electrode 213 made of a transparent conductor such as ITO (indium tin oxide) is formed. In this embodiment, this transparent electrode 213 is formed in stripe form in which two or more were parallel. In addition, the transparent electrode 231 extends in a direction orthogonal to the transparent electrode 221 formed in a stripe shape on the substrate 202, and the transparent electrode 213 and the transparent electrode 221 (see FIG. 9). A component part of the liquid crystal display panel 200 (reflective layer 211, color filter 212, transparent electrode 213, liquid crystal 204, and transparent electrode 221) included in an intersection region with a dashed-dotted line. Part in the intersection region in the pixel) constitutes the pixel G. As shown in FIG.
[94] In the present embodiment, in the colored layer 212, a deep color deepening portion 212c having a higher light density than other portions is formed above the opening 211 a of the reflective layer 211. The saturation of the light passing through the deep color portion 212c of each of the colored layers 212r, 212g, and 212b becomes high, and the saturation of the light passing through the other pale color portions becomes relatively low.
[95] In the liquid crystal display panel 200, when the reflective display is made, light passes and is visible along the reflection path R. When the transmissive display is made, the light passes and is visible along the transmission path T. At this time, in the reflection path T, the color filter 212 acts as in the prior art, but since the transmission path T passes through the opening 211a of the reflection layer 211, the transmitted light is the deep portion of the colored layers 212r, 212g, and 212b. It passes through 212c, and as a result, the saturation in transmissive display improves compared with the case of the conventional structure shown in FIG.
[96] Therefore, in the present embodiment, the darkening portion 212c is formed at a position overlapping planarly with respect to the opening portion 211a of the reflective layer 211 in the color filter 212, thereby impairing the brightness of the reflective display. Without doing so, the saturation of the transmissive display can be improved. In particular, the difference in color between the reflective display and the transmissive display can be reduced than before.
[97] Here, when the deep color portion 212c has the same thickness between the deep color portion 212c and the other pale color portion, the same color is substantially the same when the same light is transmitted through the deep color portion and the pale color portion of twice the thickness. It is preferable that it is comprised so that it may be obtained. At this time, in this specification, it is assumed that the color concentration of the deep color portion 212c is twice the light color portion. Using this expression of color concentration, more specifically, the color concentration of the color portion is preferably in the range of 1.4 times to 2.6 times of the pale color portion, and particularly preferably in the range of 1.7 times to 2.3 times. In this way, the difference between the saturation of the reflective display and the saturation of the transmissive display can be further reduced, and the difference in color between the two displays can be further reduced. Moreover, if it is the said range, it can manufacture easily by adjusting density | concentrations, such as a pigment and dye.
[98] In addition, in this embodiment, the pale color part and the deep color part 212c are arrange | positioned planarly in the colored layers 212r, 121g, 212b, and the surface (in the figure) of the colored layers 212r, 212g, 212b. Unevenness of the upper surface) can be made small, and in particular, by making the pale color portion and the rich portion the same thickness, the colored layer can be formed flat. Therefore, since the flatness of the surface of the color filter 212 can be improved, the display quality of a liquid crystal display panel can be improved.
[99] In addition, the opening of the said reflection layer is not limited to the case where it is an opening substantially, What is necessary is just a transmissive part comprised so that light may be transmitted substantially. For example, it includes the case where it is comprised so that light may be transmitted substantially by forming a part of reflective layer thinly.
[100] Second Embodiment
[101] Next, with reference to FIG. 2, the color filter substrate 301 and liquid crystal display panel 300 of 2nd Embodiment which concerns on this invention are demonstrated. In this embodiment, the substrates 301 and 302, the sealing material 303, the liquid crystal 304, the transparent electrodes 313 and 321, the retardation plates 305 and 307 and the polarizing plate 306 configured in the same manner as in the first embodiment described above. And 308, the description thereof is omitted.
[102] In this embodiment, the reflection layer 311 which has the opening part 311a as a transmission part which can permeate | transmit light substantially is provided in the surface of the board | substrate 301, and colored layers 312r, 312g, on this reflection layer 311, 312b) is formed for each pixel. These colored layers are formed in the whole pixel so that the opening part 311a may also be covered. The colored layer is formed by a light color portion formed over the reflective layer 311 over the entire pixel, and a deep color portion 312c laminated on the light color portion and having a color density higher than that of the light color portion in the same color as the light color portion. Consists of.
[103] In the present embodiment, since the colored layers 312r, 312g, and 312b are formed by the laminated structure of the pale color portion and the deep color portion 312c, only the pale color portion transmits light in the reflection path R as in the first embodiment. In the transmission path T, unlike the first embodiment, light passes through both the pale color portion and the deep color portion 312c. Therefore, as in the case of the first embodiment, the saturation of the transmissive display is improved, and the difference in the colors of the reflective display and the transmissive display can be reduced. In this case, since the transmitted light is configured to transmit both the pale color portion and the deep color portion, in this embodiment, the thickness of the deep color portion 312c can be reduced than the thickness of the deep color portion of the first embodiment. For example, when the light concentration of the deep color portion is twice the light color portion, in order to obtain optical characteristics equivalent to those of the first embodiment in this embodiment, the thickness of the deep color portion 312c may be half the thickness of the light color portion.
[104] [Third Embodiment]
[105] Next, with reference to FIG. 3, the color filter substrate 401 and liquid crystal display panel 400 of 3rd Embodiment which concerns on this invention are demonstrated. Also in this embodiment, the board | substrate 401, 402, the sealing material 403, the liquid crystal 404, the transparent electrodes 413, 421, the retardation plates 405, 407, and polarizing plates 406 comprised similarly to the said 1st Embodiment 408, the description thereof is omitted.
[106] In addition, similarly to the above embodiment, also in the present embodiment, a reflective layer 411 having an opening 411a as a transmission portion through which light is substantially transmitted is formed on the substrate 401, and the colored layer 412r, The color filter 412 which consists of 412g, 412b, the overlap light shielding part 412BM, and the protective film 412p is formed.
[107] In this embodiment, the recessed part 401a is formed for every pixel on the board | substrate 401, and this recessed part 401a is comprised in the position and shape which substantially coincide with the opening part 411a of the said reflection layer 411 planarly. It is. In this recessed portion 401a, a deep color portion 412c constituting a part of the colored portion is formed, and a light-colored pale color portion having a light density smaller than that of the deep color portion is formed on the entire color portion 412c. have.
[108] Also in this embodiment, since the colored layers 412r, 412g, and 412b have a structure in which the pale color portion and the deep color portion are laminated, they have an optical effect similar to that of the second embodiment. However, in this embodiment, since the recessed part 401a is formed on the board | substrate 401, and the deep color part 412c is formed in this recessed part 401a, flatness of the surface of a colored layer is implemented 2nd. It can be higher than in the case of form.
[109] Fourth Embodiment
[110] Next, with reference to FIG. 4, the color filter substrate 501 and the liquid crystal display panel 500 of 4th Embodiment which concerns on this invention are demonstrated. Also in this embodiment, the board | substrates 501 and 502 similar to the said 1st Embodiment, the sealing material 503, the liquid crystal 504, the transparent electrodes 513 and 521, the retardation plates 505 and 507, and the polarizing plate 506 , 508), the description thereof is omitted.
[111] In the present embodiment, unlike the configuration in which the color filter is formed on the substrate having the reflective layer as in the first to third embodiments, the color filter is formed on the substrate 501 having the reflective layer 511. Instead, the color filter 522 is formed on the substrate 502 facing the substrate 501.
[112] Similar to the above embodiments, a reflective layer 511 having an opening 511a as a transmission portion through which light is substantially transmitted is formed on the substrate 501, and a transparent insulating film 512 is formed on the reflective layer 511. The transparent electrode 513 is formed on the 512.
[113] On the other hand, the coloring layers 522r, 522g, and 522b are formed on the board | substrate 502, and the part which overlaps planarly with the opening part 511a of the said reflection layer 511 in each colored layer has a light density more than the other part. Is a high color portion 522c. And the overlap light shielding part 522BM and the protective film 522p are provided on the said colored layer, and the color filter 522 is comprised.
[114] In this embodiment, since the light passing through the reflection path R passes through the light-colored portion of the colored layer twice, and the light passing through the transmission path T passes through the deep color portion 522c, it is optically similar to the first embodiment. Can exhibit the effect of action.
[115] The color filter substrate of this embodiment is a substrate 502, and unlike the foregoing embodiment, no reflective layer is formed on the substrate 502. In other words, the color filter substrate of the present embodiment is formed as a substrate facing the substrate 501 on which the reflective layer is formed, and even in the color filter substrate not provided with the reflective layer, the color filter substrate is concentrated in a part of the colored layer provided for each pixel. By providing a part, the characteristic regarding the color of the reflective semi-transmissive liquid crystal display panel can be improved.
[116] In addition, in this embodiment, although the color filter 522 which has the structure similar to the said 1st Embodiment is formed on the board | substrate 502 which opposes the board | substrate 501 in which the reflection layer 511 was formed, this color The structure of the filter 522 may be a structure in which a deep color portion is superimposed on the light color portion similarly to the second embodiment, and a structure in which the light color portion is superimposed on the deep color portion similarly to the third embodiment, in particular, concave on the substrate 502. It may be a structure in which a portion is provided and a deep color portion is formed in the recess.
[117] [Fifth Embodiment]
[118] Next, with reference to FIG. 5, the color filter substrate and electro-optical device of 5th Embodiment which concerns on this invention are demonstrated. 5 is a schematic cross-sectional view schematically showing the structure of the liquid crystal display panel 600 of the present embodiment.
[119] The liquid crystal display panel 600 includes the substrates 601 and 602, the sealing material 603, the liquid crystal 604, the transparent electrodes 613 and 621, the retardation plates 605 and 607 configured in the same manner as in the first embodiment. Since the polarizing plates 606 and 608 are provided, these description is abbreviate | omitted.
[120] In addition, as in the first embodiment, a reflective layer 611 having an opening 611a as a transmissive portion through which light is substantially transmitted is formed on the surface of the substrate 601, and the color filter 612 is disposed on the reflective layer 611. ) Is formed. In this embodiment, the color filter 612 has the coloring layers 612r, 612g, and 612b which have uniform color density, the overlap light shielding part 612BM, and the protective layer 612p.
[121] On the other hand, on the substrate 602, the deep color layers 622r, 622g, and 622b are formed only at positions overlapping planarly with the openings 611a of the reflective layer 611, and on the deep color layers 622r, 622g, and 622b. The transparent electrode 621 is formed. The deeper layers 622r, 622g, and 622b have a color density higher than that of the colored layers 612r, 612g, and 612b.
[122] In the present embodiment, the light passing through the reflection path R transmits the colored layer on the substrate 601 twice without passing through the deep color layer formed in the above defined range, but the light passing through the transmission path T is After passing through the said colored layer, it penetrates a deep color layer further. Therefore, compared with the liquid crystal display panel of the conventional structure shown in FIG. 18, the saturation of a transmissive display can be improved and the difference in the color of a reflective display and a transmissive display can be reduced.
[123] Moreover, in this embodiment, although the colored layer on the board | substrate 601 is formed in the whole pixel, and the deep color layer on the board | substrate 602 is comprised in the limited range which overlaps planarly with the opening part 611a of the reflective layer 611, this is Alternatively, the colored layer on the substrate 601 may be formed so as to avoid a portion of the opening 611a of the reflective layer 611. In addition, in this embodiment, although the pale-colored coloring layer is formed on the board | substrate 601 in which the reflective layer 611 was formed, on the contrary, a deep color layer is formed on one board | substrate in which the reflective layer is formed, and the other You may form a pale color layer on the board | substrate of the side.
[124] [Sixth Embodiment]
[125] Next, with reference to FIG. 6, the liquid crystal display panel 700 of 6th Embodiment which concerns on this invention is demonstrated. In this embodiment, the board | substrate 701 and the board | substrate 702, the sealing material 703, the liquid crystal 704, and retardation plates 705 and 707 similar to the liquid crystal display panel 100 of the conventional structure shown in the said FIG. ), A reflective layer 711 including polarizing plates 706 and 708, an opening 711a, and a color filter 712 including colored layers 712r, 712g, and 712b.
[126] In this embodiment, a reflective layer 711 is provided on the substrate 701 and has an opening 711a as a transmission portion through which light can be transmitted substantially, and on the reflective layer 711, the opening 711a is formed. In order to avoid), the light transmitting layer 714 is partially formed. The light transmitting layer 714 may be formed of an inorganic material such as SiO ₂ , TiO ₂ , a resin such as an acrylic resin, an epoxy resin, or the like, and may be light-transmitting in the visible light region, but is particularly transparent to visible light. For example, in the visible light region, the average transmittance is preferably 70% or more and the wavelength dispersion is small (for example, the variation in transmittance is 10% or less).
[127] In addition, on the opening part 711a which is a non-formation area | region of the light transmission layer 714, the deep color part 712c is formed on the board | substrate 701 directly. Further, on the light-transmitting layer 714, a light color portion having a lower light density than the color portion 712c is formed, and the color layers 712r, 712g, and 712b are formed by the color portion 712c and the light color portion.
[128] In the present embodiment, the light transmitting layer 714 is formed so that a step is formed between the deep portion 712c and the pale color portion of the colored layer, whereby the reflective layer 711 in the pixel. The liquid crystal 704 is thick in the region overlapping planarly with the opening 711a, and thinner in the region other than the region overlapping with the opening 711a in the plane. For this reason, the transmissive display is compared with the case where the thickness of the liquid crystal 704 is substantially the same between the region overlapping the plane of the opening of the reflective layer and the other regions as in the first to fifth embodiments. You can brighten it. Here, it is preferable to comprise so that the liquid crystal thickness of the area | region which overlaps planarly with the opening part of a reflection layer may be about twice the liquid crystal thickness of the other area | region.
[129] It is explanatory drawing for demonstrating the effect at the time of changing the thickness of a liquid crystal as mentioned above. As described above, the light-transmissive layer T is formed on the reflective layer R, the light-colored portion C1 is formed thereon, and the deep color portion C2 is formed directly on the opening Ra of the reflective layer R, whereby the liquid crystal thickness of the region overlapping the opening Ra is planar. D2 was made twice the liquid crystal thickness D1 of the other area | region. Here, for convenience of explanation, the homogeneous liquid crystal cell shall be comprised. And it is said that the retardation of this liquid crystal cell is (DELTA) n * D1 = (lambda) / 4, (DELTA) n * D2 = (lambda) / 2 ((DELTA) n is optical anisotropy of a liquid crystal, (lambda) is a wavelength of light).
[130] In the above situation, when the liquid crystal cell is in the light transmissive state, in the transmissive display, as shown in Fig. 16A, the illumination light from the backlight or the like passes through the polarizing plate P2 and becomes linearly polarized light, and the phase difference plate 1 / 4 wavelength plate) After passing through D2, for example, to become right-turn circularly polarized light, and then pass through the liquid crystal layer having cell thickness D2, the phase difference proceeds by 1/2 wavelength to become left-turn circularly polarized light. Through D1, it becomes original linearly polarized light and passes through polarizing plate P1.
[131] When the liquid crystal cell is in the light transmissive state as described above, in the reflective display, as shown in Fig. 16B, external light passes through the polarizing plate P1 and becomes linearly polarized light, and the retardation plate (1/4 wavelength plate) By passing through D1, for example, right-handed circularly polarized light becomes, for example, the phase difference advances 1/2 wavelength further from passing through the liquid crystal layer having the cell thickness D1 round-trip twice, to the left-handed circularly polarized light, and then passes through the retardation plate D1. It returns to original linearly polarized light and passes through polarizing plate P1.
[132] In the transmissive display, as shown in Fig. 16C, when the thickness of the liquid crystal passing through is D1, the retardation becomes λ / 4, so that the illumination light passes the liquid crystal through the polarizing plate P2 and the retardation plate D2. After that, the polarization state becomes linearly polarized light in the direction orthogonal to the beginning, and then passes through the retardation plate D1 to become left-rotation circularly polarized light and passes through the polarizing plate P1. At this time, the polarization component that can pass through the polarizing plate P1 becomes approximately half of the amount of light that can pass when the thickness of the liquid crystal is D2.
[133] As described above, in the case of the reflective semi-transmissive liquid crystal display panel as in the present embodiment, when the thickness of the liquid crystal in the region overlapping the plane of the opening of the reflective layer is thicker than the thickness of the liquid crystal in the other region, In the case where the light transmittance in the glass becomes high and the liquid crystal thickness of the region overlapping the opening portion in a planar manner is twice as large as the liquid crystal thickness of the other region, the light transmittance is also almost doubled. If the liquid crystal cell is not homogeneous but has a twist in the liquid crystal layer, the transmittance may not be improved. However, in a liquid crystal with a 40 degree twist, for example, the liquid crystal thickness of the region overlapping the opening is planar to 2 When doubled, the transmittance | permeability improvement of about 40% is obtained.
[134] Seventh Embodiment
[135] Next, with reference to FIG. 7, the liquid crystal display panel 800 of 7th Embodiment which concerns on this invention is demonstrated. In this embodiment, the board | substrate 801 and the board | substrate 802, the sealing material 803, the liquid crystal 804, and retardation plates 805 and 807 similar to the liquid crystal display panel 100 of the conventional structure shown in the said FIG. ), A reflective layer 811 including polarizing plates 806 and 808, an opening 811a, and a color filter 812 including colored layers 812r, 812g, and 812b.
[136] In this embodiment, the underlayer 814 is partially formed on the substrate 801, and the reflective layer 811 is formed on the underlayer 814. Here, the reflective layer 811 has an opening 811a as a transmissive portion through which light is substantially transmitted for each pixel, and the opening 811a is provided corresponding to the non-forming region of the underlayer 814. In the non-formed region of the underlayer 814, a deep color portion 812c is formed on the substrate 801. Further, on the reflective layer 811, a light color portion having a lower light density than the deep color portion 812c is formed, and the color layers 812r, 812g, and 812b are formed by the light color portion and the deep color portion 812c, respectively.
[137] In the present embodiment, the base layer 814 can be made of the same material as that of the light-transmitting layer of the sixth embodiment. However, the base layer 814 does not have to be light-transmissive and may be formed of a material having light-shielding properties.
[138] Also in this embodiment, similarly to the sixth embodiment, the liquid crystal 804 is thick in the region overlapping planarly with the opening 811a of the reflective layer 811, and the liquid crystal 804 is thin in the other regions.
[139] [Eighth Embodiment]
[140] Next, with reference to FIG. 8, the liquid crystal display panel 900 of 8th Embodiment which concerns on this invention is demonstrated. In this embodiment, the board | substrate 901 and the board | substrate 902, the sealing material 903, the liquid crystal 904, and retardation plates 905 and 907 similar to the liquid crystal display panel 100 of the conventional structure shown in the said FIG. ), A reflective layer 911 including polarizing plates 906 and 908, an opening 911a, and a color filter 912 including colored layers 912r, 912g, and 912b.
[141] In this embodiment, similarly to the sixth embodiment, a reflective layer 911 having an opening 911a as a transmissive portion through which light is substantially transmitted is formed on the substrate 901, and light transmission is performed on the reflective layer 911. The layer 914 is partially formed to avoid the opening 911a, and the deep color portion 912c is formed on the substrate 901 in the formation region of the opening 911a, and the light color portion is formed on the light transmitting layer 914. The colored layers 912r, 912g, and 912b are formed by the deep color portion 912c and the light color portion, respectively.
[142] In this embodiment, the black light shielding layer 912BM is formed in the inter-pixel region on the light-transmitting layer 914 instead of the overlapping light-shielding layer of each said embodiment mentioned above. As the black light shielding layer 912BM, a black resin material such as a black pigment dispersed in a resin can be used. On this black light shielding layer 912BM, the said colored layers 912r, 912g, and 912b are formed in order, and the protective film 912p is formed on it, and is comprised in the color filter 912. As shown in FIG. Each colored layer is formed so that the peripheral edge may overlap on the black light shielding layer 912BM, respectively.
[143] In this embodiment, although the process of forming the black light shielding layer 912BM is required separately, the thickness of a color filter can be reduced compared with the case where an overlapping light shielding layer is used, and also the flatness of a color filter surface can be improved.
[144] [Ninth Embodiment]
[145] Next, with reference to FIG. 10, the manufacturing method of a color filter board | substrate is demonstrated as 9th Embodiment which concerns on this invention. The manufacturing method of this color filter substrate relates to manufacture of the color filter substrate used for the liquid crystal display panel 200 of the said 1st Embodiment.
[146] On the surface of the substrate 201, a metal such as aluminum, an aluminum alloy, a silver alloy, or chromium is first formed into a thin film by vapor deposition, sputtering, or the like, and patterned by using a known photolithography method. As shown in a), the reflective layer 211 provided with the opening part 211a is formed.
[147] Next, as shown in Fig. 10 (b), a colored photosensitive resin (photosensitive resist) formed by dispersing a pigment, a dye, or the like showing a predetermined color is applied, and the patterning is performed by exposing and developing with a predetermined pattern. This forms the pale color part of the colored layer 212r. This pale color portion has a pattern shape provided with a non-forming region (opening portion) in a portion on the opening portion 211a of the reflective layer 211. Thereafter, a photosensitive resin having a higher concentration of a coloring material such as a pigment or a dye than that of the light blue portion is applied, and patterning is performed in the same manner to the above, so that the deep color portion 212c is shown in the light colored portion. It is formed in the non-forming region. And the same process as the above is performed also to the coloring part 212g, 212b of a different color repeatedly, and as shown in FIG.10 (d), the colored layer of each color provided with the deep color part 212c is sequentially performed. I form it. Here, each colored layer is patterned so as to overlap each other in the inter-pixel region, and an overlapping light shielding layer 212BM in which a plurality of (three in the illustrated example) colored layers are overlapped is formed.
[148] In addition, as a procedure of forming a colored layer, you may form a light color part after forming the deep color part 212c contrary to the above. Further, the light colored portions may be sequentially formed on the colored layers of the plurality of colors, and the dark colored portions may be sequentially formed. On the contrary, the dark colored portions may be sequentially formed on the colored layers of the plurality of colors, and then the light colored portions may be sequentially formed. .
[149] In the formation process of the said colored layer, the raw material with high leveling property is used as photosensitive resin, and this is apply | coated by the method of obtaining flatness, such as a spin coating method. As a result, the surface of each colored layer is formed almost flat in the pixel.
[150] The surface of the color filter substrate formed in this way is formed almost flat by the formation of the protective layer 212p (not shown). Then, the liquid crystal display panel 200 shown in FIG. 1 is formed using the board | substrate 201 which is this color filter substrate.
[151] In manufacture of the liquid crystal display panel 200 shown in FIG. 1, a transparent conductor is deposited on the color filter 212 formed on the board | substrate 201 as mentioned above by sputtering, and it is well-known. The transparent electrode 213 is formed by patterning by the photolithography method. Thereafter, an alignment film made of polyimide resin or the like is formed on the transparent electrode 213, and polishing treatment is performed.
[152] Next, the substrate 201 is bonded to the substrate 202 through the sealing material 203 to form a panel structure. At this time, the transparent electrode 221, the alignment film similar to the above, etc. are already formed in the board | substrate 202 on the surface. The board | substrate 201 and the board | substrate 202 are joined so that it may become a predetermined | prescribed board | substrate space | interval by the spacer (not shown) arrange | positioned dispersedly between board | substrates, the spacer mixed in the sealing material 203, etc.
[153] Then, the liquid crystal 204 is inject | poured from the opening part which is not shown in the sealing material 203, and the opening part of the sealing material 203 is closed by sealing materials, such as an ultraviolet curable resin. After the main panel structure is completed in this manner, the retardation plates 205 and 207 and the polarizing plates 206 and 208 are mounted on the outer surfaces of the substrates 201 and 202 by bonding or the like.
[154] In this embodiment, there is a step of forming a colored layer having a pale color portion and a deeper portion having a higher light concentration than the light colored portion on a substrate, and a step of forming a reflective layer having a transmission portion on the substrate, wherein the colored layer is formed. In the step of forming, the deep color portion is formed on the transmissive portion, and the light color portion is formed on the reflective layer except for the transmissive portion.
[155] According to this, saturation can be changed according to the light emission position by providing a pale color part and a deep color part in a colored layer. In addition, by forming a deep color portion in a predetermined region on the substrate and a light color portion in addition to the predetermined region, the deep color portion and the pale color portion are formed in different planar regions, so that the thickness of the color filter can be reduced and the surface thereof can be flattened. As a result, the characteristics of the electro-optical device can be improved.
[156] [Tenth Embodiment]
[157] Next, with reference to FIG. 11, the manufacturing method of the color filter substrate which is 10th Embodiment which concerns on this invention is demonstrated. This embodiment is a method of manufacturing the color filter substrate corresponding to the board | substrate 301 used for the liquid crystal display panel 300 of 2nd Embodiment shown in FIG.
[158] In this embodiment, first, as shown in FIG. 11A, a reflective layer 311 having an opening 311a is formed on the substrate 301.
[159] Next, as shown in FIG. 11B, a light color portion of the colored layer 312r is formed on the reflective layer 311. The light color portion is formed to cover the opening 311a of the reflective layer 311.
[160] Thereafter, as shown in Fig. 11C, a deep color portion 312c is formed on the light color portion only in a region immediately above the opening 311a of the reflective layer 311, and partially dark on the light color portion. The colored layer 312r which laminated | stacked the part 312c is completed. This process is similarly repeated for other colors to form colored layers 312r, 312g and 312b as shown in Fig. 11D. At this time, the overlapping light shielding portion 312BM is also formed in the same manner as above.
[161] In this embodiment, although the coloring layer is formed sequentially for every color, after forming the said pale color part about a some color, you may form a deep color part about a some color sequentially.
[162] Moreover, when forming the liquid crystal display panel 300 shown in FIG. 2 using the color filter substrate of this embodiment, it implements similarly to the said 9th embodiment.
[163] In this embodiment, there is a step of forming a pale color portion and a colored layer having a lighter portion with a higher light concentration than the pale portion on the substrate, and in the step of forming the colored layer, the deep color portion is formed only in a region overlapping the transmissive portion of the reflective layer. And the pale color portion is formed on the substrate including the region. According to this, since the deep color part and the pale color part overlap each other in the area | region which overlaps with a permeation | transmission part, it is not necessary to form a light color part according to a deep color part, and it becomes easy to manufacture. In this case, any part of the pale color part and the deep color part may be formed thereon, and even if the pale color part and the deep color part are laminated to each other, the light color part and the deep color part may be configured so as to overlap with each other in plan view but in a state where they are separated from each other.
[164] [Eleventh Embodiment]
[165] Next, with reference to FIG. 12, the manufacturing method of the color filter substrate which is 11th Embodiment which concerns on this invention is demonstrated. This embodiment is a method of manufacturing the color filter substrate corresponding to the board | substrate 401 used for the liquid crystal display panel 400 of 3rd Embodiment shown in FIG.
[166] In this embodiment, first, as shown in FIG. 12A, a recess 401a is formed in the substrate 401. The concave portion 401a is formed with a mask (not shown) formed on the surface of the substrate 401, and selectively subjected to wet etching using a hydrofluoric acid-based etching solution or the like. ) Can be formed by etching.
[167] Next, a reflective layer 411 is formed on the surface of the substrate 401 as in the ninth and tenth embodiments. The reflective layer 411 is provided with an opening 411a in the formation region of the recess 401a by the photolithography method or the like.
[168] Thereafter, as shown in Fig. 12B, the deep portion 312c of the colored layer 312r is formed in the recess 401a. As shown in Fig. 12C, a light color portion is further formed on the deep portion 412c to form the colored layer 412r. Here, the pale color portion is formed to cover not only the deep portion 412c but also the entire pixel. Thereafter, other colors are formed in the same manner as above, and the colored layers 412g and 412b are formed.
[169] In the present embodiment, after forming the deep color portion, a light color portion having the same color is formed to form a colored layer, and the procedure is repeated for each color. However, after the deep color portion is formed for a plurality of colors, a plurality of light color portions are formed. It does not matter even if it forms sequentially about a color.
[170] Moreover, when forming a liquid crystal display panel using the color filter substrate of this embodiment, it implements similarly to the said 9th embodiment.
[171] In this embodiment, it has a process of forming a recessed part on the surface of a board | substrate, and since the permeable part of a reflection layer is comprised so that it may overlap with a recessed part, after forming a recessed part on the surface of a board | substrate, a deepening part is formed in this recessed part. By doing so, it becomes possible to form a deep color portion thickly.
[172] [Twelfth Embodiment]
[173] Next, with reference to FIG. 13, the manufacturing method of the color filter substrate which is 12th Embodiment which concerns on this invention is demonstrated. This embodiment is a method of manufacturing the color filter substrate corresponding to the substrate 701 used in the liquid crystal display panel 700 of the sixth embodiment shown in FIG. 6.
[174] In this embodiment, first, as shown in FIG. 13A, the reflective layer 711 is formed on the substrate 701. In the reflective layer 711, an opening 711a is formed for each pixel. Next, as shown in FIG. 13B, a light transmitting layer 714 is formed on the reflective layer 711. The light-transmitting layer 714 is provided with an unformed region (opening) on the opening 711a.
[175] The light transmitting layer 714 is formed at a portion except for the region immediately above the opening 711a of the reflective layer 711. The transmissive layer 714 forms an inorganic layer or an organic layer on the surfaces of the substrate 701 and the reflective layer 711 on the entire surface, and then, over the region immediately above the opening 711a by photolithography or the like. It can be formed by selective removal. As the material of the transparent layer 714, it may be used a transparent inorganic material, or a transparent acrylic resin or an organic resin such as an epoxy resin or the like, such as SiO ₂ or TiO _2.
[176] Next, as shown in FIG. 13C, a deep color portion 712c is formed on the substrate 701 in the region of the opening 711a of the reflective layer 711, and a light color portion is formed on the light transmitting layer 714. It forms and forms the colored layer 712r which consists of the deep part 712c and the pale color part. Thereafter, the same steps are performed for the other colors, respectively, to form colored layers 712g and 712b, as shown in Fig. 13D.
[177] In the present embodiment, the deep color portion 712c and the light color portion may be formed first. In addition, in this embodiment, the deepening part and the pale color part are formed before and after each other for each colored layer, The deepening part may be formed before and after each other with respect to a plurality of colors, and the pale color part may be formed before and after each other with respect to a some color.
[178] Moreover, when forming a liquid crystal display panel using the color filter substrate of this embodiment, it implements similarly to the said 9th embodiment.
[179] In this embodiment, a process of forming a colored layer having a pale color portion and a deeper portion having a higher light concentration than the pale portion, forming a reflective layer having a transmissive portion on the substrate, and substantially transmitting light on the reflective layer And a step of forming a transmissive layer, wherein in the step of forming a transmissive layer, a transmissive layer is formed on a reflective layer except for a transmissive portion, and in the step of forming a colored layer, a deep color portion is formed on a transmissive portion, and a light colored portion is transmissive. Formed on the layer. According to this, the surface level | step difference can be provided between the pale color part and the deep color part in a colored layer by the presence or absence of the light transmission layer formed on the reflection layer. In addition, the thickness of the deep color portion can be made thicker than that of the light color portion, and the saturation of the transmitted light can be further improved.
[180] [Thirteenth Embodiment]
[181] Next, with reference to FIG. 14, the manufacturing method of the color filter substrate which is 13th Embodiment which concerns on this invention is demonstrated. This embodiment is a method of manufacturing the color filter substrate corresponding to the substrate 801 used in the liquid crystal display panel 800 of the seventh embodiment shown in FIG. 7.
[182] In this embodiment, first, a base layer 814 is partially formed on the substrate 801, as shown in Fig. 14A. The base layer 814 has a predetermined non-forming region (opening) for each pixel. Next, a reflective layer 811 is formed over the base layer 814. Openings 811a are formed in the reflective layer 811 for each pixel. The opening 811a is configured to planarly conform to the non-formed region of the base layer 814.
[183] The base layer 814 can be formed by the same method using the same material as the light-transmitting layer of 12th Embodiment, and can also be formed using arbitrary materials other than a translucent material.
[184] Next, as shown in FIG. 14C, a deep color portion 812c is formed on the substrate 801 in the region of the opening 811a of the reflective layer 811, and a light color portion is formed on the reflective layer 811. Thus, the colored layer 812r including the deep color portion 812c and the light color portion is formed. Thereafter, the same steps are performed for the other colors, respectively, to form colored layers 812g and 812b, as shown in Fig. 14D.
[185] In the present embodiment, the deep color portion 812c and the light color portion may be formed first. In addition, in this embodiment, the deepening part and the pale color part are formed before and after each other for each colored layer, The deepening part may be formed before and after each other with respect to a plurality of colors, and the pale color part may be formed before and after each other with respect to a some color.
[186] Moreover, when forming a liquid crystal display panel using the color filter substrate of this embodiment, it implements similarly to the said 9th embodiment.
[187] In this embodiment, a process of forming a colored layer having a light color portion and a deeper portion having a higher light concentration than the light color portion on the substrate, a step of partially forming an underlayer on the substrate, and forming a reflective layer having a transmissive portion on the substrate In the step of forming a reflective layer, the transmissive portion is formed in the non-formed region of the underlayer, and in the step of forming the colored layer, the deep color portion is formed in the non-formed region of the underlayer, and the reflection is excluded except the transmissive portion of the reflective layer. The pale color part is formed on a layer. Thereby, the surface level | step difference can be provided between the pale-colored part and the deep color part in a colored layer with or without a base layer. In addition, the deep color portion can be formed thicker than the light color portion, and the saturation of transmitted light passing through the transmission portion can be improved.
[188] [14th Embodiment]
[189] Next, with reference to FIG. 15, the manufacturing method of the color filter substrate of 14th Embodiment which concerns on this invention is demonstrated. This embodiment is a method of manufacturing the color filter substrate corresponding to the substrate 901 used for the liquid crystal display panel 900 of the eighth embodiment shown in FIG. 8.
[190] In this embodiment, first, as shown in Fig. 15A, a reflective layer 911 having an opening 911a is formed on the surface of the substrate 901, and then on the reflective layer 911. The light transmitting layer 914 is formed. The light transmission layer 914 is provided with an opening 914a on the opening 911a of the reflective layer 911.
[191] Next, as shown in FIG. 15B, a black light shielding layer 912BM is formed over the substrate 901 and the light transmitting layer 914. More specifically, as shown to Fig.15 (a), black photosensitive resin 912t is apply | coated, this is exposed by a predetermined pattern, and it patterned by the developing process.
[192] Next, as shown in Fig. 15C, the colored layer 912r is formed by the photolithography method. More specifically, the deep color portion 912c is formed on the substrate 901 in the opening 911a of the reflective layer 911, and the color density is higher than the deep color portion 912c in the pixel region other than the opening 911a. A small pale color portion is formed, and the colored layer 912r is formed by these deep portion 912c and the pale color portion.
[193] Further, as shown in Fig. 15 (d), colored layers 912g and 912b having different colors are similarly formed. Moreover, also in this embodiment, you may form the said deepening part 912c and the pale color part first. In addition, in this embodiment, the deepening part and the pale color part are formed before and after each other for each colored layer, The deepening part may be formed before and after each other with respect to a plurality of colors, and the pale color part may be formed before and after each other with respect to a some color.
[194] In this embodiment, the light transmitting layer 914 is formed on the reflective layer 911, and the black light blocking layer 912BM is formed on the light transmitting layer 914. By the way, when the black light shielding layer 912BM is formed directly on the reflection layer which consists of metal conventionally, the black resin residue adheres on the area | region which removed black resin at the time of patterning of this black resin, and this residue is colored. The problem of reducing the brightness of the filter is known. However, in this embodiment, since the black transmissive layer 912BM is formed on the transmissive layer 914 which covers the reflective layer 911, the residue of a black resin hardly arises, and the bright color filter 912 of a high quality is carried out. ) Can be formed.
[195] Moreover, when forming a liquid crystal display panel using the color filter substrate of this embodiment, it implements similarly to the said 9th embodiment.
[196] In this embodiment, since a black light shielding layer is formed instead of the overlapping light shielding layer of each embodiment demonstrated previously, it is comprised so that the thickness of a color filter can be reduced and the flatness of the surface of a color filter can be improved. This black light shielding layer can be used in place of the overlapping light shielding layer in the first to thirteenth embodiments, respectively.
[197] In this embodiment, a process of forming a colored layer having a light color portion and a deeper portion having a higher light concentration than the light colored portion, a process of forming a reflective layer having a transmissive portion on the substrate, and substantially light can be transmitted on the reflective layer. In the step of forming a light transmitting layer, in the step of forming a light transmitting layer, a light transmitting layer is formed on the reflective layer except for the transmitting part, and in the step of forming a colored layer, a dark color part is formed on the transmitting part, and a light color part is transmitted. Formed on the layer. Thereby, the surface level | step difference can be provided between the pale-colored part and the deep color part in a colored layer with or without the light transmission layer formed on the reflective layer. In addition, the thickness of the deep color portion can be made thicker than that of the light color portion, and the saturation of the transmitted light can be further improved.
[198] [Other Configuration]
[199] Next, another structural example which can be used in each embodiment described above is demonstrated with reference to FIG.
[200] In the structural example illustrated in FIG. 17A, recesses 1001a are formed on the surface of the substrate 1001, and fine unevenness 1001b is formed on the surfaces other than the recesses 1001a. The reflective layer 1011 is formed on the fine unevenness | corrugation 1001b. The reflective layer 1011 is provided with an opening 1011a in the region on the concave portion 1001a. On these structures, the color filter 1012 which has the colored layer shown by said each embodiment is formed.
[201] In this structural example, the reflective layer 1011 is formed on the unevenness | corrugation 1001b, and is formed in fine concavo-convex shape as a whole. For this reason, since the reflected light reflected by the reflective layer 1011 is scattered suitably, when a liquid crystal display panel is comprised, reflective display prevents illusion, sunlight, etc., and the background of a display surface from being photographed. can do.
[202] Here, the unevenness 1001b can be formed with a surface roughness suitable for light scattering by selecting a composition of an etching solution such as a hydrofluoric acid in advance and etching using the etching solution. Furthermore, it can also form by forming a mask using the photolithographic method and performing etching through this mask.
[203] This structural example is applicable as it is to forming a recessed part in the surface of a board | substrate and forming a reflective layer directly on a board | substrate surface in each said embodiment. In addition, even in an embodiment in which no concave portion is formed, it is possible to apply only the structure of the unevenness 1001b and the reflective layer 1011 thereon.
[204] In the structural example shown in FIG. 17B, a reflective layer 1111 having an opening 1111a is formed on the substrate 1101, and a light transmitting layer 1114 is formed on the reflective layer 1111. An opening 1114a of the light transmitting layer 1114 is formed thereon corresponding to the opening 1111a of the reflective layer 1111. The color filter 1112 is formed on the light transmitting layer 1114.
[205] In this structural example, the microparticles | fine-particles (for example, silica particle etc.) which differ in the optical refractive index from the raw material of the transparent layer 1114 are arrange | positioned in the inside of the transparent layer 1114. For this reason, since both the light toward the reflective layer 1111 and the light reflected by the reflective layer 1111 are scattered by the light-transmitting layer 1114, similarly to the above-described configuration, confusion and clipping in reflective display can be reduced. have. In addition, this structural example is applicable to all the embodiments provided with the light-transmitting layer on the reflective layer in each said embodiment.
[206] In the structural example shown in FIG. 17C, the reflective layer 1211 having the opening 1211a is formed on the substrate 1201, and the light transmitting layer 1214 is formed on the reflective layer 1211. An opening 1214a of the light transmitting layer 1214 is formed thereon corresponding to the opening 1211a of the reflective layer 1211. The color filter 1212 is formed on the light transmitting layer 1214.
[207] In this configuration example, fine concavo-convex 1214b is formed on the surface of the light-transmitting layer 1214, and the concave-convex 1214b is configured to scatter both of the light directed to the reflective layer 1211 and the light reflected from the reflective layer 1211. It is. Therefore, also in this structural example, the confusion and image | video in a reflective display can be reduced similarly. In addition to the etching method described in the above description of the structural example shown in Fig. 17A, the concave-convex 1214b is formed by patterning a material disposed on a substrate at a predetermined cycle to form a periodic structure, followed by heating and softening to provide proper fluidity. There is a method of making a concave-convex shape by providing a. In addition, this structural example is applicable to all the embodiments provided with the light-transmitting layer on the reflective layer in each said embodiment.
[208] In the structural example shown in FIG. 17 (d), a base layer 1314 having an opening 1314a is formed on the substrate 1301, and fine unevenness 1314b is formed on the surface of the base layer 1314. The reflective layer 1311 is formed thereon. The opening 1311a is provided in the reflective layer 1311 directly above the base layer 1314a. Here, the unevenness 1314b of the underlayer 1314 can be formed by the same method as the unevenness forming method for the light transmitting layer shown in FIG. 17C. The color filter 1312 is formed on the reflective layer 1311.
[209] In this configuration example, the reflective layer 1311 is formed on the unevenness 1314b of the underlayer 1314, and the reflective surface is formed into a fine uneven shape, thereby reducing confusion, bleeding, and the like as described above. Can be. In addition, this structural example is applicable to all the embodiments in which the reflective layer is formed on the underlayer.
[210] Example 1
[211] Next, with reference to FIG. 19, Example 1 which is more detailed applicable to each said embodiment is demonstrated. 19 is an enlarged partial cross-sectional view schematically showing a part of the cross-sectional structure of the color filter substrate, and a schematic plan view of the color filter in the region corresponding thereto. Here, the enlarged partial sectional view shows a cross section taken along the P-Q line of the schematic plan view.
[212] In the first embodiment, the light transmitting layer 1414 is formed on the substrate 1401. This light transmission layer 1414 is comprised with the material which can permeate | transmit light, for example, a transparent material. In particular, it is preferable that it is comprised from an organic insulating material. On the surface 1414a of the light transmitting layer 1414, an uneven pattern is formed in which the mountain portion and the valley portion have a regular or irregular repeating pattern. This uneven | corrugated pattern can be formed by the method demonstrated by FIG. 17 (c) and (d). The thickness of the light transmitting layer 1414 is, for example, about 2 μm.
[213] On the light-transmitting layer 1414, a reflective layer 1411 made of silver alloy such as Al, Al alloy, silver, APC alloy or the like is formed. This reflective layer 1411 can be formed by sputtering, vapor deposition, or the like. The reflective layer 1411 is formed on the surface of the transmissive layer 1414, and its reflective surface is formed in an uneven shape. The thickness of this reflective layer 1411 is, for example, about 0.2 탆. The reflective layer 1411 is provided with an opening 1411a for each pixel region.
[214] On the transmissive layer 1414 and the reflective layer 1411, a color filter 1412 made of a known photosensitive resin material or the like is formed. The color filter 1412 includes a deep color portion 1412rc (red deep color portion), 1412 gc (green deep color portion), 1412bc (blue deep color portion) formed on the opening 1411a, and a light color formed on the reflective layer 1411. The colored layer which has the part 1412r (red light part), 1412g (green light part), and 1412b (blue light part) is contained.
[215] In addition, an overlapping light shielding portion 1412BM in which the deep color portions 1412rc, 1412gc, and 1412bc are stacked is formed on the light color portions 1412r, 1412g, and 1412b between the pixel areas. In this overlapping light shielding portion 1412BM, for example, the light-coloring portion 1412b is about 1.0 µm, the light-coloring portion 1412g is about 0.5 µm, and the light-coloring portion 1412r is about 0.5 µm in order from the lower layer.
[216] On the colored layer comprised as mentioned above, the protective layer 1412p comprised from the translucent material which consists of acrylic resin, organic resin, etc. is formed. The protective layer 1412p is formed on the light color portions 1412r, 1412g, and 1412b, but is not formed on the deep color portions 1412rc, 1412gc, and 1412bc. The protective layer 1412p can be formed by selectively removing a portion above the region immediately above the opening 1411a by, for example, a photolithography method after forming the inorganic layer or the organic layer on the whole surface. As the material of the protective layer (1412p), in addition to the organic resin such as transparent acrylic resin or epoxy resin, it is also possible to use transparent inorganic material such as SiO ₂ or TiO _2. The thickness of the protective layer 1412p is, for example, about 2.2 mu m.
[217] On the protective layer 1412p, a transparent electrode 1413 formed of a transparent conductor is formed. The transparent electrode 1413 is formed on the passivation layer 1412p to reflect the presence or absence of the passivation layer 1412p as it is, and the main portion between the portion where the passivation layer 1412p is present and the portion not present. Have a high order Δh. This elevation difference Δh is, for example, about 2.0 μm. In addition, the gap portion of the adjacent transparent electrode 1413 is disposed on the overlap light shielding portion 1412BM. The illustrated spacing of adjacent transparent electrodes 1413 is about 8-10 탆.
[218] In the present embodiment, since the overlap light shielding portion 1412BM is constituted by stacking the deep color portions 1412rc, 1412gc, and 1412bc, the transmittance of the laminated structure can be reduced as compared with the case where the pale color portions are laminated. It is possible to completely shield the light. In addition, since the overlapping light shielding portion 1412BM is stacked as it is on any one of the pale color portions 1412r, 1412g, and 1412b formed in the pixel region, the light transmittance of the region where the overlapping light shielding portion 1412BM is disposed can be further reduced. In addition, the elevation difference Δh can be easily provided. The superimposed light shielding portion 1412BM has a structure in which three layers are laminated on the pale color portion, but may have a structure in which two or only one layer is laminated.
[219] In the present Example 1, when comprised with the thickness dimension shown by said each example, the total thickness of a color filter board | substrate is set to 5.2-5.3 micrometers, and the thickness of the liquid crystal layer of a reflection area shall be 3.25 micrometers, and a TN type liquid crystal panel or The STN type liquid crystal panel can be configured. In this way, the thickness of the liquid crystal layer in the transmission region is 5.25 탆. In this case, as shown in Fig. 16, the thickness of the liquid crystal layer of the transmissive region is not the homogeneous liquid crystal layer and the thickness of the liquid crystal layer of the transmissive region is not twice the thickness of the liquid crystal layer of the reflective region. Since the increase of the liquid crystal layer's retardation value can be improved by improving the retardation value of the liquid crystal layer by increasing the thickness of the liquid crystal layer in the reflective region by about 60%, bright display Will be obtained.
[220] Example 2
[221] Next, with reference to FIG. 20, Example 2 applicable to the said embodiment is demonstrated. 20 is an enlarged partial cross-sectional view schematically showing a part of the cross-sectional structure of the color filter substrate, and a schematic plan view of the color filter in the region corresponding thereto. Here, the enlarged partial sectional view shows a cross section taken along the P-Q line of the schematic plan view.
[222] In the second embodiment, an uneven pattern is formed on the surface 1501a of the substrate 1501 in which the mountain portions and the valley portions are regularly or irregularly repeated by etching or the like. On the surface 1501a of the substrate 1501, a reflective layer 1511 made of silver alloy such as Al, Al alloy, silver, APC alloy or the like is formed. This reflective layer 1511 can be formed by sputtering, vapor deposition, or the like.
[223] The reflective layer 1511 reflects the concave-convex pattern of the surface 1501a, and the reflecting surface is formed in the concave-convex shape. The thickness of this reflective layer 1511 is, for example, about 0.2 탆.
[224] The reflective layer 1511 is provided with an opening 1511a for each pixel region.
[225] On the reflective layer 1511, a color filter 1512 made of a known photosensitive resin material or the like is formed. The color filter 1512 includes a deep portion formed on the opening portion 1511a (1512rc (red deep portion), 1512 gc (green deep portion), 1512bc (blue deep portion), and a light color formed on the reflective layer 1511. The colored layer which has the part 1512r (red light part), 1512g (green light part), and 1512b (blue light part) is contained.
[226] On the color filter 1512 comprised as mentioned above, the protective layer 1512p comprised from the translucent material which consists of acrylic resin, organic resin, etc. is formed. The protective layer 1512p is formed on the light color portions 1512r, 1512g, and 1512b, but is not formed on the deep color portions 1512rc, 1512gc, and 1512bc. The protective layer 1512p can be formed by selectively removing a portion above the region immediately above the opening 1511a by, for example, a photolithography method after forming the inorganic layer or the organic layer on the entire surface. As the material of the protective layer (1512p), in addition to the organic resin such as transparent acrylic resin or epoxy resin, it is also possible to use transparent inorganic material such as SiO ₂ or TiO _2. The thickness of the protective layer 1512p is, for example, about 2.2 mu m.
[227] On the protective layer 1512p, a transparent electrode 1513 formed of a transparent conductor is formed. The transparent electrode 1513 is formed on the protective layer 1512p to reflect the presence or absence of the protective layer 1512p as it is, and the main portion between the portion where the protective layer 1512p is present and the portion that does not exist is present. Have a high order Δh. As this elevation difference (DELTA) h, it is about 2.0 micrometers, for example.
[228] In Example 2, the overlapping light shielding portion formed in Example 1 was not formed. Instead, the gap G of the adjacent transparent electrodes 1513 is narrowed down to about 4-6 micrometers in width. In this embodiment, in the gap G of the adjacent transparent electrodes 1513, a transverse electric field is generated due to the potential difference between the adjacent transparent electrodes 1513 in the driving state of the display body. The light-shielding effect in the said gap G is obtained using what the liquid crystal molecule of the gap G arrange | positions according to an electric field.
[229] Also in the present Example 2, when comprised with the thickness dimension shown by said each example, it becomes possible to comprise a TN type liquid crystal panel or STN type liquid crystal panel by making the thickness of the liquid crystal layer of a reflection area into 3.25 micrometers. In this way, the thickness of the liquid crystal layer in the transmission region is 5.25 탆. In this case, as shown in Fig. 16, the thickness of the liquid crystal layer of the transmissive region is not the homogeneous liquid crystal layer and the thickness of the liquid crystal layer of the transmissive region is not twice the thickness of the liquid crystal layer of the reflective region. Since the increase of the liquid crystal layer's retardation value can be improved by improving the retardation value of the liquid crystal layer by increasing the thickness of the liquid crystal layer in the reflective region by about 60%, bright display Will be obtained.
[230] Example 3
[231] Next, with reference to FIG. 21, Example 3 which is more detailed applicable to each said embodiment is demonstrated. 21 is an enlarged partial cross-sectional view schematically showing a part of the cross-sectional structure of the color filter substrate, and a schematic plan view of the color filter in the region corresponding thereto. Here, the enlarged partial sectional view shows a cross section taken along the P-Q line of the schematic plan view.
[232] In the third embodiment, a reflective layer 1611 made of silver alloy such as Al, Al alloy, silver, APC alloy or the like is formed on the substrate 1601. This reflective layer 1611 can be formed by sputtering, vapor deposition, or the like. The reflective layer 1611 is formed flat on the flat surface of the substrate 1601. The thickness of this reflective layer 1611 is, for example, about 0.2 탆. The reflective layer 1611 is provided with an opening 1611a for each pixel region.
[233] On the reflective layer 1611, a color filter 1612 made of a known photosensitive resin material or the like is formed. The color filter 1612 includes a deep color portion 1612rc (red deep color portion), 1612 gc (green deep color portion), 1612bc (blue deep color portion) formed on the opening 1611a, and a light color formed on the reflective layer 1611. The colored layer which has the part 1612r (red light part), 1612g (green light part), and 1612b (blue light part) is contained.
[234] In addition, an overlapping light shielding portion 1612BM formed by stacking the deep color portions 1612rc, 1612gc, and 1612bc is formed on the pale portions 1612r, 1612g, and 1612b between the pixel areas. In this overlapping light shielding portion 1612BM, for example, the pale color portion 1612b is about 1.0 mu m, the pale portion 1612g is about 0.5 mu m, and the pale portion 1612r is about 0.5 mu m in order from the lower layer.
[235] On the color filter 1612 comprised as mentioned above, the protective layer 1612p comprised from the translucent material which consists of acrylic resin, organic resin, etc. is formed. The protective layer 1612p includes a portion where the overlap light shielding portion 1612BM is formed, and is configured to have a substantially flat surface. As the material of the protective layer (1612p), in addition to the organic resin such as transparent acrylic resin or epoxy resin, it is also possible to use transparent inorganic material such as SiO ₂ or TiO _2. The thickness of the protective layer 1612p is, for example, about 2.2 mu m.
[236] On the protective layer 1612p, a transparent electrode 1613 formed of a transparent conductor is formed.
[237] In the present embodiment, since the overlapping light shielding portion 1612BM is configured by stacking the deep color portions 1612rc, 1612gc, and 1612bc, the light shielding between the pixel regions can be performed more completely. In addition, since the overlapping light shielding portion 1612BM is stacked as it is on any one of the pale color portions 1612r, 1612g, and 1612b formed in the pixel region, the light transmittance of the overlapping light shielding portion 1612BM can be further reduced. The overlap light shielding portion 1612BM has a structure in which three layers are laminated on the pale color portion, but may have a structure in which only two or one layer is laminated.
[238] In the third embodiment, the scattering layer 1619 is disposed on the observation side than the color filter 1612. By the scattering layer 1619, the background image in a specific viewing direction, haunting, lack of brightness, and the like caused by the specular reflection of external light by the reflecting layer 1611 are reduced. As the scattering layer 1619, it is preferable to have forward scattering characteristics. For example, what disperse | distributed the microparticles | fine-particles which consist of another transparent material slightly different in refractive index from this base material in a transparent base material is mentioned.
[239] As the scattering layer 1619, an adhesive layer having an adhesive function can be used. For example, a transparent adhesive is used as a substrate, and transparent particulates slightly different in refractive index from the substrate are dispersed. In this case, as shown, it can be used as an adhesive layer for bonding the substrate 1602 on the observation side (indicated by a dashed line in the figure) and the retardation plate 1605 or polarizing plate 1606 disposed on the observation side. Can be. In addition, the structure on the surface of the board | substrate 1602, and a liquid crystal layer are abbreviate | omitted in drawing.
[240] [Configuration example of color filter]
[241] Finally, with reference to FIG. 22 and FIG. 23, the structural example of the color filter 1412, 1512, 1612 of the said Embodiment 1-3 which concerns on this invention is demonstrated. In addition, this structural example can be similarly applied to the color filter of each said embodiment except the said Examples 1-3. Fig. 22 is a spectral characteristic diagram (a) showing the spectral characteristics of the transmitted light of the deep color portion of the color filter, the xy chromaticity diagram (b) of the CIE (1931) color system of the transmitted light, and a ^* of the CIE (1976) color system of the transmitted light. It is b ^* chromaticity diagram (c), and FIG. 23 is a spectral characteristic diagram (a) which shows the spectral characteristic of the transmitted light of the light color part of the said color filter, the xy chromaticity diagram (b) of the CIE (1931) color system of the transmitted light, and the transmitted light A ^* b ^* chromaticity diagram (c) of the CIE (1976) colorimetric system. Here, each said figure shows the result of having calculated | required the spectral transmittance | permeability and chromaticity coordinate of the transmitted light which permeate | transmitted the light once to each deep color part or each pale color part using the same C light source.
[242] As shown in Fig. 22, the main transmittance region of the red deep color portion R is 600 to 700 nm, and the average transmittance of this region is about 90%, especially in the region of 640 to 700 nm, the maximum transmittance (about 95%). It is becoming. The main transmissive region of the green-colored green portion G is 495 to 570 nm, and the average transmittance of this region is about 85%, particularly in the region of 510 to 550 nm, the maximum transmittance (about 90%). The main transmissive region of the blue deep portion B is 435 to 500 nm, and the average transmissivity of this region is about 85%, particularly in the region of 445 to 480 nm, the maximum transmittance (about 88%).
[243] The Y value of the CIE color system 1931 is about 24-26 in the red deep portion R, about 70-72 in the green deep portion G, and about 29-31 in the blue deep portion B. The L ^* value of the CIE color system 1976 is about 56 to 58 in the red deep portion R, about 86 to 88 in the green deep portion G, and about 60 to 62 in the blue deep portion B.
[244] In addition, the area of the triangle having three points corresponding to the colors of the red deep portion R, the green deep portion G, and the blue deep portion B in the chromaticity diagram is about 0.05 (xy chromaticity diagram). ) And about 7000 (a ^* b ^* chromaticity diagram).
[245] On the other hand, as shown in Fig. 23, the main transmission region of the red light-colored portion R is 585 to 700 nm, and the average transmittance of this region is about 93%, especially in the region of 590 to 700 nm, the maximum transmittance (about 96%). ) The main transmission region of the green light-colored portion G is 480 to 600 nm, and the average transmittance of this region is about 92%, especially in the region of 500 to 580 nm, the maximum transmittance (about 94%). The main transmission region of the blue light portion B is 430-510 nm, and the average transmittance of this region is about 89%, and the transmittance is maximum (about 92%) especially in the region of 440-500 nm.
[246] In addition, the Y value of the CIE color system 1931 is 46-48 in the red light part R, 89-91 in the green light part G, and 44-46 in the blue light part B. The L ^* value of the CIE color system 1976 is about 73 to 75 in the red light portion (R), 95 to 97 in the green light portion (G), and about 72 to 74 in the blue light portion (B).
[247] In addition, the area of the triangle having three points corresponding to the colors of the red pale color portion R, the green pale color portion G, and the blue pale color portion B in the chromaticity diagram is about 0.01 (xy chromaticity diagram. ) And about 1700 (a ^* b ^* chromaticity diagram).
[248] As described above, the relationship between the light-colored portion and the light-colored portion with respect to the light density is greater than that of the light-colored portion in the Y value or L ^* value corresponding to the luminous transmittance and brightness. Here, it is preferable that the value of a pale color part is about 1.2 to 2.5 times the value of a deep color part. In addition, about the area of the triangle on the chromaticity diagram corresponding to saturation, the area of the triangle on the chromaticity diagram of the deep color portion is larger than the area of the triangle on the chromaticity diagram of the pale color portion. Here, it is preferable that the area of the triangle on the chromaticity diagram of the deep color portion is about 3 to 8 times the area of the triangle on the chromaticity diagram of the light color portion.
[249] Moreover, as light density, it can also be defined according to manufacturing conditions and a structure as well as the index on the above-mentioned optical characteristic. For example, when forming the colored layer of a color filter, there exists a magnitude relationship of the quantity of coloring materials, such as a pigment and dye, mixed in the state disperse | distributed in a colored layer. That is, in the deep color portion, the amount (weight or volume) of the colorant per unit volume is larger than that of the light color portion.
[250] [Electronics]
[251] Finally, the specific example of the electronic device provided with the electro-optical device (liquid crystal display panel) of said each embodiment is demonstrated. 24 is a schematic perspective view showing the appearance of the cellular phone 2000 as an example of an electronic device. The cellular phone 2000 is provided with an operation unit 2002 provided with an operation switch on the surface of the casing 2001, and further includes a voice detection unit 2003 including a detector such as a microphone, and a sounding machine such as a speaker. The voice generator 2004 is provided. A part of the casing 2001 is provided with the display part 2005, and it is comprised through this display part 2005 so that the display screen of the electro-optical device of each said embodiment arrange | positioned inside can be visually recognized. About this electro-optical device, a display signal is transmitted from the control part provided in the casing 2001, and the display image according to this display signal is displayed.
[252] 25 is a schematic perspective view illustrating an appearance of the wrist watch 3000 as an example of an electronic device. This watch 3000 has a watch main body 3001 and a watch band 3002. External operating members 3003 and 3004 are provided in the clock main body 3001. Moreover, the display part 3005 is provided in the front surface of the watch main body 3001, and it is comprised so that the display screen of the electro-optical device of each said embodiment arrange | positioned inside can be visually recognized through this display part 3005. About this electro-optical device, a display signal is transmitted from the control part (clock circuit) provided in the clock | work body 3001, and the display image corresponding to this display signal is displayed.
[253] 26 is a schematic perspective view showing the appearance of a computer device 4000 as an example of an electronic device. In this computer device 4000, an MPU (microprocessor unit) is configured inside the main body 4001, and an operation unit 4002 is provided on the outer surface of the main body 4001. In addition, a display portion 4003 is provided, and the electro-optical device of each of the above embodiments is housed inside the display portion 4003. And it is comprised so that the display screen of an electro-optical device can be visually recognized through the display part 4003. This electro-optical device is configured to receive a display signal from an MPU provided in the main body 4001 and display a display image according to the display signal.
[254] In addition, the color filter substrate and electro-optical device of the present invention, the manufacturing method of the color filter substrate, the manufacturing method of the electro-optical device, and the electronic apparatus are not limited only to the above-described example, but do not depart from the gist of the present invention. Of course, various changes can be made to the extent that they do not.
[255] For example, in each of the embodiments described above, all of the passive matrix liquid crystal display panels are exemplified. As the electro-optical device of the present invention, an active matrix liquid crystal display panel (for example, a TFT (thin film transistor) or a TFD (thin film diode) is used. ) Can be similarly applied to a liquid crystal display panel provided with a switching element). In addition to the liquid crystal display panel, the present invention is similarly applied to various electro-optical devices capable of controlling the display state for each of a plurality of pixels, such as an electroluminescence device, an organic electroluminescence device, a plasma display device, and the like. It is possible to apply.
[256] In addition, the color filter substrate of this invention is not limited to the said electro-optical device, It can use for various display apparatuses, an imaging device, and other various optical devices.
[257] According to the present invention, when used in a display device that enables both a reflective display and a transmissive display, it is possible to provide a color filter substrate capable of ensuring both the brightness of the reflective display and the saturation of the transmissive display. It is possible to provide a reflective semi-transmissive electro-optical device which can ensure the brightness of the display and the saturation of the transmissive display, and can realize a display technology that can reduce the difference in color between the reflective display and the transmissive display. Can be.

权利要求:
Claims (17)
[1" claim-type="Currently amended] In the color filter substrate,
Substrate,
A colored layer disposed on the substrate, the colored layer having a light portion and a deep portion having a higher light density than the light portion;
A reflective layer disposed on the substrate and having a transmissive portion that is substantially transparent to light,
The color filter substrate is disposed so as to overlap at least the transmissive portion in a planar manner.
[2" claim-type="Currently amended] The method of claim 1,
The reflecting layer has a reflecting portion in portions other than the transmitting portion,
The transmission part is an opening provided in the reflective layer,
And said pale color portion being disposed so as to overlap at least in said reflecting portion in plan view.
[3" claim-type="Currently amended] The method of claim 1,
The said colored layer has a laminated structure of the said light-colored part and the said deep color part, The color filter substrate characterized by the above-mentioned.
[4" claim-type="Currently amended] The method of claim 1,
And a light transmitting layer that is substantially transparent to light, partially disposed between the reflective layer and the colored layer, wherein the deep color portion is disposed in an area where the light transmitting layer is not disposed. Filter substrate.
[5" claim-type="Currently amended] The method of claim 4, wherein
The light transmitting layer has a scattering function for scattering light, characterized in that the color filter substrate.
[6" claim-type="Currently amended] The method of claim 1,
And a base layer partially disposed between the reflective layer and the substrate, wherein the deep color portion is disposed in an area where the base layer is not disposed.
[7" claim-type="Currently amended] The method of claim 6,
The surface of the reflective layer has a fine concave-convex to scatter light.
[8" claim-type="Currently amended] The method of claim 1,
The substrate has a recess, and the deep color portion is disposed in the recess.
[9" claim-type="Currently amended] Disposed on a substrate, provided with a colored layer having a deep color portion,
The color filter substrate has a higher light density than other portions.
[10" claim-type="Currently amended] The method of claim 9,
And a light transmitting layer that is substantially transparent to light, and partially disposed between the substrate and the colored layer, wherein the deep color portion is disposed in an area where the light transmitting layer is not disposed. Filter substrate.
[11" claim-type="Currently amended] The method of claim 9,
The substrate has a recess, and the deep color portion is disposed in the recess.
[12" claim-type="Currently amended] In the electro-optical device,
An electro-optic layer comprising an electro-optic material,
A substrate supporting the electro-optical layer;
A reflective layer disposed on the substrate and having a transmissive portion that is substantially transparent to light;
A colored layer disposed on the substrate and having a deeper portion and a deeper portion having a higher light concentration than the light portion,
The deep color portion is disposed so as to overlap at least in the transmissive portion in plan view.
[13" claim-type="Currently amended] In the electro-optical device,
An electro-optic layer comprising an electro-optic material,
A first substrate supporting the electro-optical layer;
A reflective layer disposed on the first substrate and having a transmissive portion that is substantially transparent to light;
A second substrate disposed opposite the first substrate,
A colored layer disposed on the second substrate, the colored layer having a light color portion and a deep color portion having a higher light density than the light color portion;
The deep color portion is disposed so as to overlap at least in the transmissive portion in plan view.
[14" claim-type="Currently amended] In the manufacturing method of a color filter substrate,
Forming a pale color portion of the colored layer in the first region;
And forming a deep color portion of the colored layer having a higher light concentration than the light color portion in a second region adjacent to the first region.
[15" claim-type="Currently amended] The manufacturing method of the electro-optical device containing the manufacturing method of the color filter substrate of Claim 14 as a process.
[16" claim-type="Currently amended] An electronic apparatus comprising the electro-optical device according to claim 12.
[17" claim-type="Currently amended] An electronic apparatus comprising the electro-optical device according to claim 13.

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同族专利:

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公开号 | 公开日

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CN1189779C|2005-02-16|

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US6785068B2|2004-08-31|

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JP2003090997A|2003-03-28|

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US20030021000A1|2003-01-30|

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CN2562204Y|2003-07-23|

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TWI245142B|2005-12-11|

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CN1397821A|2003-02-19|

引用文献:

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公开号 | 申请日 | 公开日 | 申请人 | 专利标题

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法律状态:
2001-07-13|Priority to JPJP-P-2001-00213427

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2001-07-13|Priority to JP2001213427

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2002-06-14|Priority to JPJP-P-2002-00174961

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2002-06-14|Priority to JP2002174961A

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2002-07-12|Application filed by 세이코 엡슨 가부시키가이샤

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2003-01-23|Publication of KR20030007148A

优先权:

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申请号 | 申请日 | 专利标题

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JPJP-P-2001-00213427|2001-07-13|

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JP2001213427|2001-07-13|

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JPJP-P-2002-00174961|2002-06-14|

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JP2002174961A|JP2003090997A|2001-07-13|2002-06-14|Color filter substrate and electrooptical device, method for manufacturing color filter substrate and method for manufacturing electrooptical device and electronic appliance|